Precision Patterning with Maskless Laser Lithography

The μMLA Heidelberg Instruments Laser Writer revolutionizes nanofabrication by offering maskless lithography, enabling rapid and flexible pattern creation. This tool is ideal for prototyping and small-scale production in nanotechnology.

Using a high-precision laser, the μMLA writes patterns directly onto photosensitive substrates, achieving resolutions below 1 micron. Its computer-controlled stage and optics support complex designs, from microfluidic channels to photonic lattices. The absence of physical masks reduces costs and accelerates iteration, making it a favorite for research and development.

At our facility, we use the μMLA to fabricate custom nanostructures, such as diffraction gratings for optical sensors, achieving efficiencies above 90%. Its compatibility with various resists and substrates, including glass and polymers, supports diverse applications like biosensors or flexible electronics.

Our team optimizes exposure parameters to minimize defects, ensuring high-fidelity patterns. We also provide consultation on design software integration, streamlining the workflow from CAD to fabrication. As laser lithography advances with faster scanning systems, our services ensure clients leverage these innovations for cutting-edge results.