Advancing Nanotechnology with High-Precision Lithography Systems

The frontier of nanotechnology is defined by the ability to create intricate patterns at the nanoscale, and tools like the Raith EBPG5200 Electron Beam Lithography System and the EVG-620 Mask Aligner are pivotal in this endeavor. These systems enable the fabrication of cutting-edge devices with applications in quantum technology, photonics, and microelectronics.

The Raith EBPG5200 leverages electron beam lithography to achieve resolutions below 2 nanometers, ideal for crafting complex nanostructures like quantum dots or nanoantennas. Its high-speed beam scanning and automated calibration ensure precision across large-area substrates, making it a preferred choice for producing high-density integrated circuits. The system’s advanced software allows for dynamic pattern adjustments, reducing errors in multi-layer fabrication and enabling innovations in 3D nanostructure development.

The EVG-620 Mask Aligner, on the other hand, excels in photolithography, transferring intricate patterns onto substrates with sub-micron accuracy. Equipped with advanced alignment systems, it supports both contact and proximity exposure modes, catering to applications from MEMS to optoelectronic devices. Its versatility in handling various mask sizes and substrate materials makes it a cornerstone for high-throughput production.

At our TU Delft and Kavli Nanolab facility, we integrate these tools into customized nanofabrication workflows. For example, we use the EBPG5200 to fabricate nanoscale gratings for photonic sensors, achieving efficiencies that surpass industry benchmarks. The EVG-620 supports rapid prototyping of microfluidic chips, enabling precise alignment for multi-layer designs. Our team provides comprehensive support, from process optimization to quality assurance, ensuring devices meet stringent specifications.

We also emphasize sustainability, employing energy-efficient processes and recyclable substrates where possible. Our consultation services guide clients in selecting optimal lithography techniques, balancing cost, resolution, and scalability. As lithography evolves with innovations like extreme ultraviolet (EUV) integration, our services remain at the forefront, delivering solutions that drive nanotechnology forward.